Pixel-level dose correction improves the quality of masks written by multi-beam.
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Russia plans EUV chipmaking tools that it says will be cheaper and easier to build than ASML's — country outlines new roadmap to smaller chipsoptical proximity correction (OPC), and resolution enhancement techniques (RET) would need to be recalibrated or updated with new process models tailored for 11.2 nm. Development will proceed in ...
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